首页> 外国专利> POSITIVE TYPE RADIOSENSITIVE MIXTURE AND RADIOSENSITIVE COPYING MATERIAL CONTAINING SAID COMPOUND

POSITIVE TYPE RADIOSENSITIVE MIXTURE AND RADIOSENSITIVE COPYING MATERIAL CONTAINING SAID COMPOUND

机译:包含所述化合物的正型放射敏感性混合物和放射敏感性复制材料

摘要

PURPOSE: To make a radiation sensitive mixture usable for a lithographic printing plate having high printing ability or as a heat resistant photoresist by incorporating a combination of a high mol.wt. binder soluble in an aq. alkali soln. but insoluble in water with specified compds. CONSTITUTION: This radiation sensitive mixture contains a combination of a high mol.wt. binder soluble in an aq. alkali soln. but insoluble in water with 1,2-quinone diazide or a compd. forming a strong acid when exposed to chemical rays and a compd. contg. a cleavable C-O-C bond. A polymer having units represented by formula I is contained as the binder. In the formula I, R1 is H, halogen, etc., each of R2 -R4 is H, alkyl, etc., each of R5 -R7 is H, halogen, etc., X is a group of atoms required to form a carbocyclic arom. ring and (n) is 1, 2 or 3. This mixture is usable as a photoresist or for lithography.
机译:用途:通过掺入高分子量的组合物,使辐射敏感性混合物可用于具有高印刷能力的平版印刷版或用作耐热光致抗蚀剂。溶于水的粘合剂碱溶液。但不溶于水,具有规定的化合物。组成:这种对辐射敏感的混合物包含高分子量的组合。溶于水的粘合剂碱溶液。但不溶于水与1,2-醌二叠氮化物或化合物。暴露于化学射线中会形成强酸和化合物。续可裂解的C-O-C键包含具有由式I表示的单元的聚合物作为粘合剂。式I中,R 1为H,卤素等,R 2 -R 4为H,烷基等,R 5 -R 7为H,卤素等,X为形成α的原子。碳环芳烃环和(n)为1、2或3。该混合物可用作光刻胶或用于光刻。

著录项

  • 公开/公告号JPH0252349A

    专利类型

  • 公开/公告日1990-02-21

    原文格式PDF

  • 申请/专利权人 HOECHST AG;

    申请/专利号JP19890154797

  • 申请日1989-06-19

  • 分类号G03F7/022;G03F7/004;G03F7/023;G03F7/032;G03F7/039;H01L21/027;H01L21/30;

  • 国家 JP

  • 入库时间 2022-08-22 06:23:16

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