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Kobunshorinarusoseibutsu

机译:古代作文

摘要

PURPOSE:To obtain a high polymer composition, capable of forming a stabilized fine dispersion system and having excellent heat resistance, breaking strength, modulus of elasticity and flexural strength, by blending an N-substituted p- oriented wholly aromatic polyamide with a flexible high polymer. CONSTITUTION:A composition consisting of (A) one or more N-substituted wholly aromatic polyamides, consisting of recurring units expressed by formulas I and/or II (X, Y and Z are H and/or group expressed by formula III, H and/or group expressed by formula IV, H and/or group expressed by formula V or H and/or group expressed by formula VI; Ar1-Ar3 are bifunctional p-oriented aromatic groups and preferably p-phenylene group; k is 7-25; l is 1-6; n is 1-10 and m is an optional integer; Ar4 is aromatic group expressed by formula VII, etc.; R1-R4 are H, CH3, etc.; M is H or Li, Na, K, Rb or Cs) and having =2mol.% substitution ratio (N-substitution ratio or graft ratio) and =0.1 inherent viscosity and (B) flexible high polymer.
机译:目的:通过将N-取代的p-定向全芳族聚酰胺与柔性高分子共混,可获得能够形成稳定的精细分散体系并具有优异的耐热性,断裂强度,弹性模量和挠曲强度的高分子组合物。组成:一种由(A)一种或多种N-取代的全芳族聚酰胺组成的组合物,该聚酰胺由式I和/或II表示的重复单元组成(X,Y和Z为H和/或由式III,H和/或由式IV,H表示的基团和/或由式V或H表示的基团和/或由式VI表示的基团; Ar 1 -Ar 3是双官能的对位芳族基团,优选对亚苯基; k为7-25 ; l为1-6; n为1-10且m为可选整数; Ar4为式VII等表示的芳族基团; R1-R4为H,CH3等; M为H或Li,Na, K,Rb或Cs)且具有> = 2摩尔%的取代比(N取代比或接枝比)和> = 0.1固有粘度和(B)柔性高聚物。

著录项

  • 公开/公告号JPH0246619B2

    专利类型

  • 公开/公告日1990-10-16

    原文格式PDF

  • 申请/专利权人 TAKAYANAGI MOTOO;

    申请/专利号JP19880179092

  • 申请日1988-07-20

  • 分类号C08L77/00;

  • 国家 JP

  • 入库时间 2022-08-22 06:21:58

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