首页> 外国专利> FORMATION OF GRAFT COPOLYMER AND PATTERN FORMING METHOD UTILIZING THIS FORMING METHOD AS WELL AS BASE POLYMER FOR GRAFT COPOLYMERIZATION AND RESIST

FORMATION OF GRAFT COPOLYMER AND PATTERN FORMING METHOD UTILIZING THIS FORMING METHOD AS WELL AS BASE POLYMER FOR GRAFT COPOLYMERIZATION AND RESIST

机译:接枝共聚物的形成和图案形成方法,利用该形成方法以及用于接枝共聚和抵抗的基础聚合物

摘要

PURPOSE:To prevent the degradation in graft copolymer forming efficiency by the influence of oxygen in the atm. by adding a material which forms radicals stable to oxygen by bonding to the radicals in a base polymer formed by irradiation of radiations into the base polymer. CONSTITUTION:The material which forms the radicals stable to oxygen by bonding to the radicals of the base polymer 1 generated by irradiation of radiations is added into the base polymer 1 and a mixed film 10 is formed. The film is then irradiated with gamma rays in a vacuum to form the radicals 4 stable to oxygen. After the mixed film 10 is once ejected into the atm. contg. oxygen 5, the film is carried into a graft polymn. reaction chamber and immediately evacuation is started; thereafter, the vapor of a monomer 6 is introduced into the graft polymn. reaction chamber to effect a graft polymn. reaction. The formation of the graft copolymer without degrading the graft polymn. reaction efficiency by the oxygen in the atm. is executed in this way.
机译:目的:为了防止在大气中的氧气影响下接枝共聚物的形成效率下降。通过加入形成对氧稳定的自由基的材料,该材料通过键合到通过辐射到基础聚合物中而形成的基础聚合物中的自由基上。组成:将与氧辐照产生的基础聚合物1的自由基键合形成对氧稳定的自由基的材料添加到基础聚合物1中,并形成混合膜10。然后在真空中用γ射线辐照该膜以形成对氧稳定的自由基4。之后,将混合膜10一次喷射到自动柜员机中。续在氧气5中,薄膜被带入接枝聚合物。反应室并立即开始疏散;之后,将单体6的蒸气引入接枝聚合物中。反应室以实现接枝polymn。反应。接枝共聚物的形成而不会降低接枝聚合物的含量。反应效率受大气中氧气的影响。以这种方式执行。

著录项

  • 公开/公告号JPH02978A

    专利类型

  • 公开/公告日1990-01-05

    原文格式PDF

  • 申请/专利权人 HITACHI LTD;

    申请/专利号JP19880128394

  • 申请日1988-05-27

  • 分类号G03F7/004;C08F2/46;C08F291/00;C08F291/18;G03F7/38;H01L21/027;H01L21/30;

  • 国家 JP

  • 入库时间 2022-08-22 06:20:08

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