首页>
外国专利>
FORMATION OF GRAFT COPOLYMER AND PATTERN FORMING METHOD UTILIZING THIS FORMING METHOD AS WELL AS BASE POLYMER FOR GRAFT COPOLYMERIZATION AND RESIST
FORMATION OF GRAFT COPOLYMER AND PATTERN FORMING METHOD UTILIZING THIS FORMING METHOD AS WELL AS BASE POLYMER FOR GRAFT COPOLYMERIZATION AND RESIST
展开▼
机译:接枝共聚物的形成和图案形成方法,利用该形成方法以及用于接枝共聚和抵抗的基础聚合物
展开▼
页面导航
摘要
著录项
相似文献
摘要
PURPOSE:To prevent the degradation in graft copolymer forming efficiency by the influence of oxygen in the atm. by adding a material which forms radicals stable to oxygen by bonding to the radicals in a base polymer formed by irradiation of radiations into the base polymer. CONSTITUTION:The material which forms the radicals stable to oxygen by bonding to the radicals of the base polymer 1 generated by irradiation of radiations is added into the base polymer 1 and a mixed film 10 is formed. The film is then irradiated with gamma rays in a vacuum to form the radicals 4 stable to oxygen. After the mixed film 10 is once ejected into the atm. contg. oxygen 5, the film is carried into a graft polymn. reaction chamber and immediately evacuation is started; thereafter, the vapor of a monomer 6 is introduced into the graft polymn. reaction chamber to effect a graft polymn. reaction. The formation of the graft copolymer without degrading the graft polymn. reaction efficiency by the oxygen in the atm. is executed in this way.
展开▼