首页> 外国专利> THE METHOD OF MEASUREMENT OF THE SCATTERING MATRIX OF REVERSIBLE TWO-PORT MICROWAVES AS WELL AS AUTOMATICALLY SWITCHED OVER THREE GATE ARRANGEMENT FOR MEASUREMENT OF THE SCATTERING MATRIX OF TWO-PORT MICROWAVES

THE METHOD OF MEASUREMENT OF THE SCATTERING MATRIX OF REVERSIBLE TWO-PORT MICROWAVES AS WELL AS AUTOMATICALLY SWITCHED OVER THREE GATE ARRANGEMENT FOR MEASUREMENT OF THE SCATTERING MATRIX OF TWO-PORT MICROWAVES

机译:可逆两端口微波散射矩阵的测量方法以及自动切换三门排列的三端口微波散射矩阵的测量方法

摘要

The method for measuring the S matrix of microwave reversible two-ports with amplitude and phase switched triple-gate reflectometer, to the input gates of which the inciting signal with established frequency is fed, the reflectometer being calibrated by connecting reference reflactances to its output gates, consisting in that after calibration three input reflectances Τ', Τ'', Τ''' of the three-state reflecting system (F3/1) are measured, and then to the output gates of the reflectometer (R) the input gates of the examined reversible two-port (Sx) are connected, to the output gates of which the three-state reflecting system (F3/1) is connected, and then with the reflectometer (R) three input reflectances Τw', Τw'', Τw''' are determined, which correspond with the input reflectances Τ', Τ'', Τ''' of the three-state reflecting system (F3/1), the input reflectance of the examined two-port opened at the output Τw+ and the input reflectance of the examined two-port closed at the output Τw- are determined, and the terms of the S matrix of the examined two-port are computed in accordance with the following relation: - reflection coefficient with the second gates matched IMAGE - transmittance with the second gates matched IMAGEIMAGE
机译:用幅度和相位切换三门反射仪测量微波可逆两端口S矩阵的方法,向其输入门馈入已建立频率的激励信号,通过将参考反射率连接到其输出门来校准反射仪,其特征在于,在校准之后,测量三态反射系统(F3 / 1)的三个输入反射率Τ',Τ'',Τ''',然后将其输入到反射计(R)的输出栅极将被检查的可逆两端口(Sx)中的一个连接到三态反射系统(F3 / 1)的输出门上,然后使用反射计(R)将三个输入反射率Τw',Τw''确定,,与三态反射系统(F3 / 1)的输入反射率Τ',Τ'',Τ'''相对应,检查的两个端口的输入反射率在输出Τw<+>并在输出Τw<处关闭了检查的两个端口的输入反射率->被确定,并且根据以下关系式计算被检查的两端口的S矩阵的项:-第二栅极匹配的反射系数-第二栅极匹配

著录项

  • 公开/公告号PL272292A1

    专利类型

  • 公开/公告日1989-11-13

    原文格式PDF

  • 申请/专利权人 POLITECHNIKA WARSZAWSKA;

    申请/专利号PL19880272292

  • 发明设计人 MORAWSKI TADEUSZ;ZBOROWSKA JOLANTA;

    申请日1988-05-06

  • 分类号G01R;

  • 国家 PL

  • 入库时间 2022-08-22 06:17:55

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