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Semiconductor quantum effect device having negative differential resistance characteristics

机译:具有负微分电阻特性的半导体量子效应器件

摘要

A semiconductor quantum effect device having negative differential resistance characteristics includes : a composite potential barrier layer including a first potential barrier layer (I) and a second potential barrier layer (II), a carrier injection side semiconductor layer (III) connected in contact with the first potential barrier layer; and a carrier injected side semiconductor layer (IV) connected in contact with the second potential barrier layer (II).;The semiconductor material elements forming the respective layer satisfy the condition that, when the voltage is not applied to the semiconductor material elements, the energy level (EC3, EC4, resp) at the bottom of conduction band in the carrier injection side semiconductor layer (III) and in the carrier injected side side semiconductor layer (IV) is lower than the energy level at the top of the valence band (EV2) in the second potential barrier layer (II) and that a Fermi level (EF2) within the second potential barrier layer (II) is nearly at the same level as the Fermi level (EF4) within the barrier injected side semiconductor layer (IV), and an electron (e) and a hole (h) are operated in a cooperative relation therebetween.
机译:具有负的差动电阻特性的半导体量子效应器件包括:包括第一势垒层(I)和第二势垒层(II)的复合势垒层,与该势垒层接触的载流子注入侧半导体层(III)。第一势垒层; ;和与第二势垒层(II)接触连接的载流子注入侧半导体层(IV)。形成各个层的半导体材料元件满足以下条件:当不向半导体材料元件施加电压时,载流子注入侧半导体层(III)和载流子注入侧半导体层的导带底部的能级(E C3 ,E C4 ,分别) (IV)低于第二势垒层(II)的价带顶部的能级(E V2 ),而费米能级(E F2 第二势垒层(II)中的>)与注入势垒侧半导体层(IV)中的费米能级(E F4 )几乎处于同一水平,并且电子(e)和孔(h)以它们之间的协作关系操作。

著录项

  • 公开/公告号EP0363238A3

    专利类型

  • 公开/公告日1990-04-25

    原文格式PDF

  • 申请/专利权人 FUJITSU LIMITED;

    申请/专利号EP19890402492

  • 发明设计人 FUJII TOSHIO;YOKOYAMA NAOKI;

    申请日1989-09-12

  • 分类号H01L29/88;H01L29/205;

  • 国家 EP

  • 入库时间 2022-08-22 06:13:40

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