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Process for locally increasing the refractive indexes of an electrooptical material usable in guided optics and material obtained by this process

机译:用于局部增加可用于导向光学器件的电光材料和通过该方法获得的材料的折射率的方法

摘要

Process for locally increasing the refractive indexes of an electrooptical material usable in guided optics and material obtained by this process.PPThe process according to the invention consists of carrying out an implantation of ions (6) of sulphur or a metallic dopant able to take the place of a cation of the crystal lattice of the ferroelectric material (2), followed by annealing at between 300. degree. and 600° C. in order to rearrange the crystal lattice disturbed during implantation and for activating the implanted ions. Ion implantation is carried out in an inclined direction (60) with respect to the normal to the surface of the monocrystalline material (2). For a LiNbO.sub.3 monocrystal, use is made of Ti ions as the dopant. This process makes it possible to produce a guide layer (4) having ordinary and extraordinary refractive indices above those of the pure monocrystal.
机译:用于局部增加可在导引光学器件中使用的电光材料和通过该方法获得的材料的折射率的方法。根据本发明的方法包括进行硫或金属离子(6)的注入。能够代替铁电材料(2)晶格阳离子的掺杂剂,然后在300度之间进行退火。为了重新排列在注入期间受干扰的晶格并激活注入的离子,在600℃和600℃下进行。相对于单晶材料(2)的表面的法线在倾斜方向(60)上进行离子注入。对于LiNbO 3单晶,使用Ti离子作为掺杂剂。该过程使得可以产生具有比纯单晶的折射率高的寻常和非常高的折射率的引导层(4)。

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