THIN HARD AMORPHOUS CARBON-HYDROGEN-SILICON FILM HAVING LUBRICITY, FERROUS METALLIC MATERIAL HAVING THIS THIN FILM ON SURFACE, AND THEIR PRODUCTION

摘要

PURPOSE:To obtain a steel material which has a thin amorphous C-H-Si film layer having high hardness and excellent in lubricity by forming a metal carbide layer and a thin amorphous film composed of C, H and Si on the surface of a steel material by a plasma CVD method. CONSTITUTION:A base 12 as a cathode is disposed in a vessel 17 made of stainless steel as a plasma reaction chamber 11, and a ferrous specimen 13 composed of high speed steel, etc., is placed as a material to be treated on the above base 12. After the inside of the vessel 17 is evacuated, a CH4 gas for carburizing is introduced together with H2 and Ar gases through a gas-introducing hole 16 and plasma discharge is initiated between the stainless steel vessel 17 as an anode and the base 12 as a cathode, by which an Fe carbide layer is formed to 0.1-10mum thickness on the surface of the high speed steel material 13. Subsequently, a gaseous mixture of SiCl, CH4, H2, and Ar is supplied into the vessel 17, and the amorphous extremely hard thin C-H-Si film having a composition in which 30-50atomic% H2 is contained and the balance is composed of 70%, by atomic ratio, of C and Si as the rest, containing pseudo-diamond, and reduced in friction coefficient can be formed to 0.5-10mum thickness by a plasma CVD method.