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METHOD FOR GIVING A MERCURY MANIPULATOR TESTIMONIAL

机译:给予汞操纵者证言的方法

摘要

The method is applied in the semiconductor equipment, and in particular in the control over the parameters of semiconductor materials and structures, with which precision is enhanced. The method: it determines the area of quicksilver contact through measurement of its resistance in contact with a metallic plate and the capacity of the quicksilver contact at the operative pressure of the quicksilver and in the implementation of a contact with the dielectric of the metal-dielectric structure with thickness of the dielectric from 0.08 to 0.12 mkm and a certain relative capacity. The aptitude of the manipulator for measurement is determined by comparing the values for area and capacity of the quicksilver with sample values derived from pure quicksilver in quicksilver contact of the manipulator.
机译:该方法应用于半导体设备,尤其是在控制半导体材料和结构的参数中,从而提高了精度。该方法:通过测量其与金属板的接触电阻以及在金属银的工作压力下以及在与金属电介质的电介质接触的实现中金属与银的接触的能力,确定金属与银的接触面积。电介质厚度为0.08至0.12 mkm,且具有一定的相对容量。通过比较生化银的面积和容量值与从生化银在生化器接触中获得的样本值进行比较,来确定机械手的测量能力。

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