PROCESS FOR PREPARING A CHARGE COUPLED DEVICE WITH CHARGE TRANSFER DIRECTION BIASING IMPLANTS

摘要

AN IMPROVED PROCESS FOR PREPARINGA CHARGE COUPLED DEVICE WITHCHARGE TRANSFER DIRECTION BIASING IMPLANTSAbstract of the DisclosureA process is disclosed of preparing a chargecoupled device containing charge transfer directionbiasing implants wherein the steps and materials forpatterning electrodes and implants promote accurateedge alignments of implants and electrodes whileminimizing strains and avoiding temperatures thatpermit unwanted lattic or intersticial ion migrationin the semiconductive substrate.