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ELECTROLYTIC METHOD FOR THE DISSOLUTION OF COPPER PARTICLES FORMED DURING ELECTROLESS COPPER DEPOSITION

机译:电解沉积铜过程中溶解的铜微粒的电解方法

摘要

The metal particles of non-adherent copper formed in an electrodeposition bath (3) when the electroless plating of electroless copper on the surface of activated substrate (4) are oxidized and redissolved in this bath. For this we briefly applies a current between an anode member and a cathode immersed in the bath, the anode member (5, 6) being composed of an anode surface (5a, 6a) also parallel and close as possible to the surface bottom of the container (2) containing the bath (3).
机译:当无电铜在活化衬底(4)表面上的化学镀覆被氧化并再溶解时,在电沉积浴(3)中形成的非粘附铜的金属颗粒被氧化。为此,我们简短地在阳极部件和浸入浴中的阴极之间施加电流,阳极部件(5、6)由阳极表面(5a,6a)组成,阳极表面(5a,6a)也平行于并尽可能靠近阳极的表面底部。装有水浴(3)的容器(2)。

著录项

  • 公开/公告号EP0428660A1

    专利类型

  • 公开/公告日1991-05-29

    原文格式PDF

  • 申请/专利权人 MACDERMID INCORPORATED;

    申请/专利号EP19900907949

  • 发明设计人 KUKANSKIS PETER E.;RETALLICK RICHARD C.;

    申请日1990-01-23

  • 分类号C23C18/38;C23C18/31;C23C18/40;

  • 国家 EP

  • 入库时间 2022-08-22 05:52:50

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