PHOTORESIST COMPOSITIONS CONTAINING COBALT (III) COMPOUND AND REDOX TRANSFER LIGAND

摘要

An imaging negative-working composition suitable for use as a dry film resist, comprises a mixture of (a) a binder polymer, (b) a compound of Co (III) capable of partial reduction Co (II) upon exposure to activating radiation, and (c) a redox transfer ligand capable of reacting with Co (II) to form a chelate Co (II) reducing the compound of Co (III) remaining adjacent and forming a chelate Co (III) effective to impart differential solubility to the image composition. the composition can be exposed on an image to activating radiation such as a laser, heat, and developing with a developer to form a resist image in the exposed areas. An element comprising a support and a layer of the above composition is particularly useful in the manufacture of printed circuit boards by direct imaging laser.