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PHOTORESIST COMPOSITIONS CONTAINING COBALT (III) COMPOUND AND REDOX TRANSFER LIGAND

机译:含钴(III)化合物和氧化还原转移配体的光致抗蚀剂组合物

摘要

an imaging composition adapted for use in negative working as a reserve of dry film, comprises a mixture of (a) a binder polymer, (b) a compound of co (iii) to a partial reduction in the co (ii) upon exposure to a radiation powerand (c) a redox transfer ligand capable of interacting with co (ii) to form a chelate compound, reducing the co (ii), co (iii) adjacent to and forming a chelate which co (iii) effective to confer differential solubility of image composition.we can describe the composition of an image to a radiation such as a laser activation, heat, and developing with a developer to form an image of a subject in the exposed areas. an element comprising a support and a layer of the above composition is particularly useful in the manufacture of printed circuit boards by laser direct imaging.
机译:适于在负片中用作干膜储备的成像组合物,其包含以下物质的混合物:(a)粘合剂聚合物,(b)钴(iii)的化合物,暴露于以下条件下会部分还原co(ii)辐射能和(c)能够与co(ii)相互作用形成螯合物,还原co(ii),co(iii)并与之形成螯合物的氧化还原转移配体,其中co(iii)有效地赋予差异图像成分的溶解度。我们可以描述图像成分对辐射的影响,例如激光激活,加热以及用显影剂显影以在曝光区域中形成对象的图像。包含载体和具有以上组成的层的元件在通过激光直接成像制造印刷电路板中特别有用。

著录项

  • 公开/公告号EP0449969B1

    专利类型

  • 公开/公告日1994-02-16

    原文格式PDF

  • 申请/专利权人 EASTMAN KODAK CO;

    申请/专利号EP19900901452

  • 发明设计人 DOMINH THAP;

    申请日1989-12-21

  • 分类号G03C1/67;G03F7/26;

  • 国家 EP

  • 入库时间 2022-08-22 04:39:46

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