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PHOTORESIST COMPOSITIONS CONTAINING COBALT (III) COMPOUND AND REDOX TRANSFER LIGAND
PHOTORESIST COMPOSITIONS CONTAINING COBALT (III) COMPOUND AND REDOX TRANSFER LIGAND
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机译:含钴(III)化合物和氧化还原转移配体的光致抗蚀剂组合物
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摘要
an imaging composition adapted for use in negative working as a reserve of dry film, comprises a mixture of (a) a binder polymer, (b) a compound of co (iii) to a partial reduction in the co (ii) upon exposure to a radiation powerand (c) a redox transfer ligand capable of interacting with co (ii) to form a chelate compound, reducing the co (ii), co (iii) adjacent to and forming a chelate which co (iii) effective to confer differential solubility of image composition.we can describe the composition of an image to a radiation such as a laser activation, heat, and developing with a developer to form an image of a subject in the exposed areas. an element comprising a support and a layer of the above composition is particularly useful in the manufacture of printed circuit boards by laser direct imaging.
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