Photolithographic process for etching plate mfr. - processing pattern data to provide individual synthetic pattern data controlling exposure

摘要

The process is used to mfr a pair of front and rear master plates and a pair of front and rear working plates for an etching process using supplied indivdual pattern data which is processed via a logic operation to obtain individual synthetic pattern data. This is used to control continuous and collective exposure of a photosenstive glass plate via a photolithographic device, to obtain a latest image which is developed to provide a postive pattern. The pattern is used for contact exposure to obtain a negative master pattern plate and contact exposure via the latter to obtain the positive master pattern plate. ADVANTAGE - High quality uniformity.