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Chemical vapor deposition of cadmium mercury telluride

机译:碲化镉汞的化学气相沉积

摘要

In the manufacture of an electronic device, e.g. an infrared detector of cadmium mercury telluride, a gas stream (36) comprising two or more reactants is passed over a heated substrate (29) in a reaction zone (C) of a reactor vessel (1) so as to deposit material in a layer (30) on the substrate (29). One reactant, e.g. a readily decomposible cadmium alkyl (Me.sub.2 Cd), is supplied to the reaction zone (C) by means of an injection tube (b 12) which passes through a heated first zone (A) of the vessel (1). The tube (12) has a narrow bore (y) to provide a high flow velocity for this reactant (Me.sub.2 Cd) through the first zone (A). In accordance with the invention, the tube (12) widens in at least one dimension (x), towards its outlet end, so as to provide a wider outlet for injecting the reactant (Me.sub.2 Cd) into the gas stream (38,36) with a lower flow velocity which matches more closely the flow velocity of the gas stream (38,36). A more balanced mixing is achieved leading to improved compositional homogeneity in the deposited layer (30), even for difficult materials such as cadmium mercury telluride. The heated first zone (A) may comprise a capsule (2) containing e.g. a pool of mercury (3), and such a capsule (2) preferably has an outlet (a) of smaller cross- sectional area within which the widened outlet of the injection tube (12) is concentrically arranged so that the gas stream (38) is symmetrically constricted around the outlet of the injection tube (12).
机译:在制造电子设备时,例如在碲化镉镉的红外检测器中,将包含两种或更多种反应物的气流(36)在反应器容器(1)的反应区(C)中通过加热的基材(29),以在层中沉积材料(30)在基板(29)上。一种反应物,例如通过注入管(b 12)将易于分解的烷基镉(Me.sub.2 Cd)供应到反应区(C),该注入管穿过容器(1)的加热的第一区(A)。管(12)具有狭窄的孔(y),以通过第一区域(A)为该反应物(Me 2 Cd)提供高流速。根据本发明,管(12)朝着其出口端在至少一个尺寸(x)上变宽,从而提供了更宽的出口,用于将反应物(Me 2 Sub)注入到气流(较低的流速与气流(38,36)的流速更接近地匹配。即使对于诸如碲化镉汞之类的难加工材料,也可以实现更加平衡的混合,从而导致沉积层(30)中的成分均匀性得到改善。加热的第一区域(A)可包括包含例如碳酸氢钠的胶囊(2)。汞池(3),并且这样的胶囊(2)最好具有较小横截面积的出口(a),注入管(12)的加宽出口同心布置,从而使气流(38) )在注射管(12)的出口周围对称收缩。

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