Method of reducing surface damage in KTP optical waveguides

摘要

A method for producing an optical waveguide which comprises imersing a wafer of K.sub.1-x Rb.sub.x TiOMO.sub.4, wherein 0≦x≦1, and M is P or As, for 1-64 hours in molten potassium nitride at 400°- 500° C., followed by washing and immersing in a molten salt of Rb, Cs, or Tl at 240°-335° C., thereby causing the Rb, Cs, or Tl to replace the K or Rb cations. The resultant product has reduced mechanical damage to the waveguide surface.