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MASK PATTERN DESIGN DEVICE AND MASK PATTERN DESIGN INFORMATION DISPLAY METHOD

机译:面具图案设计装置和面具图案设计信息显示方法

摘要

PURPOSE:To lighten the load on a designer by selecting arrangement relation image data indicating that a specified element and other elements are in specific arrangement relation and displaying an image based upon the image data. CONSTITUTION:When a command for displaying a circuit diagram image is inputted with a mouse 17, circuit information on a storage device 20 is transferred to a processor 18 and circuit diagram image data are generated. An elliptic figure 9 for arranging transistors(TR) 6 and 7 closely together with resistances 4 and 5 and TRs 6-8 is displayed as a circuit diagram image in a window 2 on a graphic display 15 according to the image data. Then an operator specifies an optional element among elements displayed in the window 2 and inputs a pattern generation command and the mask pattern of the specified element is displayed as an image in a window 3. Consequently, the layout of a mask pattern is made without referring to the circuit diagram and the load on the designer is lightened.
机译:目的:通过选择指示指定元素和其他元素处于特定排列关系的排列关系图像数据并基于该图像数据显示图像,减轻设计人员的负担。组成:当用鼠标17输入用于显示电路图图像的命令时,存储设备20上的电路信息将传输到处理器18,并生成电路图图像数据。根据图像数据,在图形显示器15上的窗口2中显示用于将晶体管(TR)6和7与电阻4和5以及TR 6-8紧密布置在一起的椭圆形图9作为电路图图像。然后,操作员在窗口2中显示的元素中指定可选元素,并输入图案生成命令,并且所指定元素的掩模图案在窗口3中显示为图像。因此,无需参考即可进行掩模图案的布局。电路图,减轻了设计人员的负担。

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