CALIBRATION GRID AND MANUFACTURE AND CLEANING THEREOF, GRID AND MANUFACTURE THEREOF, OPERATION OF ELECTRONBEAM LITHOGRAPHY MACHINE AND PRODUCT MANUFACTURED BY PROCESSINCLUDING ELECTRON BEAM LITHOGRAPY STEP

摘要

PURPOSE: To provide a reusable calibration grid that allows an electron beam lithography process to the executed inexpensively and speedily. CONSTITUTION: Grid lines 28 are flush with a body 20 as shown in figure 2d in a calibration grid, and at the same time the grid lines 28 are supported from a side surface by a groove 27 that is formed at the grid body. The support from the side surface achieves purification after having been contaminated, due to a volatile material from a resist during use. Also, since the accuracy of the grid is improved due to the manufacturing technique of the groove, an integrated circuit and a mask can be designed with improved flexibility and at the same time, can be manufactured with reduced cost, high integration, and high manufacturing yield.