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METHOD AND DEVICE FOR TREATING MICROSCOPIC PART, AND METHOD AND DEVICE FOR ANALYSING MICROSCOPIC PART

机译:显微部件的处理方法和装置,以及显微部件的分析方法和装置

摘要

PURPOSE:To detect and correct defective patterns on the surfaces or insides of elements or substrates, and detect and analyze foreign substances at a space resolving power of 20nm or shorter by joining together a near optical scanning microscope (NSOM) and a scanning tunnel microscope (STEM). CONSTITUTION:The output 110 of a light source 109 such as a laser which has penetrated an intermediate optical system 111 and focused by a lens 108 is introduced to a MOS chip 107 with a narrow opening part them after it penetrates a sample 101 and is focused at a focus lense 115, it enters a detector 116. The microscopic part of the sample 101 is detected by a NOSM and the chip 107 having a microscopic projection 206 thereon, while atoms at its tip approaches those on the surface of the sample 101 to a distance of about 2nm and flows a tunnel current at an applied voltage of several volts, functioning as STM. The function gives a process, a film, T = -n, etc., to the microscopic part, enabling the detection and correction of defective patterns, and the analysis of foreign substances, etc., at an atmospheric resolving power of 20 mum or shorter.
机译:目的:通过将近光学扫描显微镜(NSOM)和扫描隧道显微镜结合在一起,以检测和校正元件或基板表面或内部的缺陷图案,并以20nm或更小的空间分辨能力检测和分析异物(干)。组成:诸如激光的光源109的输出110穿过中间光学系统111并由透镜108聚焦后,在其进入样品101并聚焦后,以狭窄的开口部分引入MOS芯片107。在聚焦透镜115处,它进入检测器116。样品101的微观部分由NOSM和芯片107上具有微观突起206的芯片检测,同时其尖端的原子接近样品101表面的原子,从而到达样品101的表面。距离约为2nm,并在几伏的施加电压下流过隧道电流,起STM的作用。该功能可以在20 mum或更高的大气分辨力下对微观部分进行处理(薄膜,T = -n等),从而能够检测和纠正缺陷图案,并分析异物等。较短。

著录项

  • 公开/公告号JPH0434824A

    专利类型

  • 公开/公告日1992-02-05

    原文格式PDF

  • 申请/专利权人 HITACHI LTD;

    申请/专利号JP19900138197

  • 申请日1990-05-30

  • 分类号G01B7/34;G01B21/00;G01Q30/02;G01Q60/02;G01Q60/10;G01Q60/18;G01Q80/00;G02B21/00;G11B9/00;G11B9/14;H01J37/28;H01J37/30;H01J37/305;H01J37/317;H01L21/20;H01L21/205;H01L21/285;H01L21/66;H01L21/82;

  • 国家 JP

  • 入库时间 2022-08-22 05:39:08

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