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EXTRA THIN SILICON STEEL STRIP HIGH IN DEGREE OF INTEGRATION IN (110)001 DIRECTION AND LOW IN CORE LOSS AND ITS MANUFACTURE
EXTRA THIN SILICON STEEL STRIP HIGH IN DEGREE OF INTEGRATION IN (110)001 DIRECTION AND LOW IN CORE LOSS AND ITS MANUFACTURE
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机译:(110)<001>方向的集成度较高的超薄硅钢带,其磁芯损耗及其制造方法低
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摘要
PURPOSE:To manufacture an extra thin silicon steel strip extremely high in magnetic flux density and low in core loss in a high exciting area by subjecting a grain-oriented silicon steel sheet having a compsn. constituted of Si, Sn, Sb and Fe to cold rolling, thereafter forming an area with low magnetic permeability and executing primary recrystallization annealing. CONSTITUTION:A grain-oriented silicon steel strip contg., by weight, =8% Si, 0.005 to 0.30% of one or two kinds of Sn and Sb and the balance substantial Fe, having a texture in the {110}001 direction and having the magnetic flux density of 0.9 B8/Bs (Bs denotes the saturation magnetic flux density in the componental system) is subjected to cold rolling at 60 to 90% draft for at least one time into the final sheet thickness of =150mum. Next, this steel sheet is subjected to primary recrystallization annealing, and after that, an area having lower magnetic permeability than that of ferrite (steel sheet) is periodically formed in the vicinity of the surface of the steel sheet. In this way, the extra thin silicon steel sheet high in the degree of integration in the {110}001 direction and low in core loss can be manufactured. In the above method, after the cold rolling and the formation of the area having low magnetic permeability, primary recrystallization annealing may be executed.
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