DEPOSITION OF TUNGSTEN FILMS FROM MIXTURES OF TUNGSTEN¹HEXAFLUORIDE, ORGANOHYDROSILANES AND HYDROGEN

• 1. 用六氟化钨(WF6)回蚀进行钨沉积 [P] . 中国专利： CN105453230B . 2019.06.14
• 2. 用六氟化钨(WF6)回蚀进行钨沉积 [P] . 中国专利： CN105453230A . 2016-03-30
• 3. Deposition of tungsten films from mixtures of tungsten hexafluoride organohydrosilanes and hydrogen [P] . 美国专利： US5433975A . 1995-07-18

  机译： 用六氟化钨有机氢硅烷和氢气的混合物沉积钨膜

• 4. DEPOSITION OF TUNGSTEN FILMS FROM MIXTURES OF TUNGSTEN HEXAFLUORIDE,ORGANOHYDROSILANES AND HYDROGEN [P] . IL100050D0 . 1992-08-18

  机译： 六氟化钨，有机羟基硅烷和氢的混合物中钨膜的沉积

• 5. DEPOSITION OF TUNGSTEN FILMS FROM MIXTURES OF TUNGSTEN HEXAFLUORIDE, ORGANOHYDROSILANES AND HYDROGEN [P] . CA2055422A1 . 1992-05-21

  机译： 六氟化钨，有机羟基硅烷和氢的混合物中钨膜的沉积

• 1. Molecular Dynamics Simulations of Deposition and Damage on Tungsten Plasma-Facing Materials by Tungsten Dust [J] . NIU Guojian, LI Xiaochun, DING Rui, 等离子体科学和技术（英文版） . 2014,第008期
• 2. CHARACTERISTICS OF TUNGSTEN CARBIDE FILMS PREPARED BY PLASMA ASSISTED ATOMIC LAYER DEPOSITION USING BIS(TERT-BUTYLIMIDO)BIS(DIMETHYLAMIDO)TUNGSTEN [C] . Do-Heyoung Kim, Yong Jae Kim, Yo Soon Song, Electrochemical Society Meeting and International Symposium on Chemical Vapor Deposition XVI and EUROCVD 14 Conference v.1; 20030427-20030502; Paris; FR . 2003
• 3. Advantages of using PVD two-step titanium nitride barrier process and the impact of residual by-products from tungsten film deposition on process integration due to non-uniformity of the tungsten film. [D] . Sidhwa, Ardeshir (Ardy) Jenangir. 2002
• 4. Electrodeposition of Ti-Doped Hierarchically Mesoporous Silica Microspheres/Tungsten Oxide Nanocrystallines Hybrid Films and Their Electrochromic Performance [O] . Ya Song, Zhiyu Zhang, Lamei Yan, 2019
• 5. Tungsten Cladding of Tungsten-Uranium Dioxide (W-UO2) Composites by Deposition from Tungsten Hexafluoride (WF6) [O] . Lamartine, J.T., Hoppe, A.W. 1965
• 6. Tungsten cladding of tungsten uranium dioxide (W-UO2) composites by deposition from tungsten hexafluoride (WF 6), task 1 [R] . Lamartine, J. T., Hoppe, A. W. 1965

• 1. Fabrication of Tungsten Carbide Films by Filtered Pulse Arc Deposition with Cemented Tungsten Carbide Cathodes [J] . Ryo Isono ,Tsuyoshi Tanimoto ,Yushi Iijima . 材料科学与应用期刊（英文） . 2017,第13期
• 2. Fabrication of tungsten films by metallorganic chemical vapor deposition [J] . Yi Li ,Jin-pu Li ,Cheng-chang Jia . 矿物冶金与材料学报 . 2012,第012期
• 3. Plasma Enhanced Chemical Vapor Deposition Nanocrystalline Tungsten Carbide Thin Film and Its Electro-catalytic Activity [J] . Huajun ZHENG ,Chunan MA ,Jianguo HUANG . 材料科学技术：英文版 . 2005,第4期
• 4. INDUCTION PLASMA REACTIVE DEPOSITION OF TUNGSTEN CARBIDE FROM TUNGSTEN METAL POWDER [J] . X.L. Jiang Institute of Surface and Coatings Technology Central South University Changsha 410083 China M.I. Boulos Department of Chemical Engineering University of Sherbrooke Sherbrooke J1K 2R1 Canada . 金属学报：英文版 . 2001,第5期
• 5. 分离有机/有机混合物的PVA、CA系列膜及其渗透汽化性能研究(Ⅰ)膜材料与成膜工艺 [C] . 蔡邦肖 ,余黎 ,叶海林 . 2001年膜技术应用国际会议 . 2001
• 6. 六氟化钨中杂质气体分析方法的建立及其应用和气—质联用法测定水果中保鲜剂残留 [A] . 彭淑女 . 2013