PROCESS FOR DEPOSITING THIN LAYERS BY LASER PULSE VAPOUR DEPOSITION

摘要

A process is disclosed for depositing thin layers by laser pulse vapour deposition (LPVD). LPVD installations are disclosed for producing thin and extra-thin layers, in particular in optics, X-ray optics and microelectronics. In an embodiment of the process, a pulse laser beam (L) focussed on the surface of a curved target (T) is moved by a rotatably mounted plane reflector (PS) and by a cylindrical reflector (ZS). The pulse laser beam is moved on the curved surface of the target by swinging the plane reflector around an axis that extends in the direction of the beam through a plane drawn across its surface. In another embodiment of the invention, the substrate (S) pivots in synchronism with the movement of the pulse laser beam on the curved surface of the target.