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Electron impact ion source for trace analysis

机译:电子碰撞离子源,用于痕量分析

摘要

An apparatus for analyzing trace elements in a gas sample includes a feedback system (46, 64, 68, 70) for accurately regulating and sensing the pressure supplied to an ion chamber (32), and an ion detector (34) calibrated for accurately scaling the measurements of trace elements. The ion chamber (32) is a closed ion source which is resistant to corrosion and aids in the reduction of noise. Two filaments (96, 98) mounted outside the ion chamber (32) adjacent apertures (90) in the chamber wall are thereby shielded from the ions. A cylindrical reflector (94) is aligned to axial with and disposed around the ion chamber (32). A quadrupole analyser (23) receives the ions through an aperture (88) and is shielded by the ion chamber (32) from electrons from the filaments (96, 98).
机译:用于分析气体样品中痕量元素的设备包括:反馈系统(46、64、68、70),用于精确地调节和感测提供给离子室(32)的压力;以及经过校准的离子检测器(34),用于精确缩放比例微量元素的测量。离子室(32)是封闭的离子源,该离子源耐腐蚀并有助于降低噪声。从而将安装在离子室(32)外侧并与室壁中的孔(90)相邻的两条细丝(96、98)与离子隔离。圆柱形反射器(94)与离子室(32)轴向对准并围绕离子室(32)设置。四极分析器(23)通过孔(88)接收离子,并被离子腔(32)屏蔽,使之免受灯丝(96、98)发出的电子的影响。

著录项

  • 公开/公告号EP0311224B1

    专利类型

  • 公开/公告日1991-12-18

    原文格式PDF

  • 申请/专利权人 UTI INSTRUMENTS COMPANY;

    申请/专利号EP19880202519

  • 发明设计人 PICKETT FREDERICK P.;LIN KUO-CHIN;

    申请日1984-03-01

  • 分类号H01J49/04;H01J49/14;G01N33/00;

  • 国家 EP

  • 入库时间 2022-08-22 05:30:49

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