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METHOD OF NON-DESTRUCTIVE MEASURING OF SATURATION MAGNETIZATION AND ANISOTROPY CONSTANT OF FERROMAGNETIC FILMS

机译:铁磁薄膜饱和磁化强度和各向异性常数的非破坏性测量方法

摘要

the invention u043eu0442u043du043eu0441u0438u0442u0441u00a0 to u0440u0430u0434u0438u043eu044du043bu0435u043au0442u0440u043eu043du0438u043au0435 and electronic engineering and can be used in the measurement of parameters of ferromagnetic films as in the equi u0437u0432u043eu0434u0441u0442u0432u0430, and in the manufacture of film spin wave microwave appliances.the essence of the method u0437u0430u043au043bu044eu0447u0430u0435u0442u0441u00a0 that spin waves excite microwave variable magnetic field simultaneously in two u043eu0431u043bu0430u0441u0442u00a0u0445 at u0444u0435u0440u0440u043eu043cu0430u0433u043du0438u0442u043du043eu0439 u043fu043bu0435u043du043a and with each orientation u043fu043eu0441u0442u043eu00a0u043du043du043eu0433u043e magnetic u043fu043eu043bu00a0 u0438u0437u043cu0435u0440u00a0u044eu0442 frequency u0441u043fu0438u043du043eu0432u044bu0445 waves corresponding to minimize frequency dependence of high frequency poweru0438u0441u0441u043bu0435u0434u0443u0435u043cu043eu0442u043e reflected from the sample and the expected parameters of the film u043eu043fu0440u0435u0434u0435u043bu00a0u044eu0442 on u0437u043du0430u0447u0435u043du0438u00a0u043c frequencies measured by dispersing u0441u043eu043eu0442u043du043eu0448u0435u043du0438u0439.2 il.
机译:本发明 u043e u0442 u043d u043e u0441 u0438 u0442 u0441 u00a0至 u0440 u0430 u0434 u0438 u043e u044d u043b u0435 u0435 u043a u0442 u0440 u043e u043d u043d u0438 u043a u0435和电子工程学,可用于测量铁磁薄膜的参数,例如,在等价于 u0437 u0432 u043e u0434 u0441 u0442 u0432 u0430和薄膜自旋波微波设备的制造中。方法的本质 u0437 u0430 u043a u043b u044e u0447 u0430 u0435 u0442 u0441 u00a0旋转波在两个 u043e u0431 u043b u043b u0430 u0441 u0442中同时激发微波可变磁场 u00a0 u0445位于 u0444 u0435 u0440 u0440 u043e u043c u0430 u0433 u043d u0438 u0442 u043d u043d u043e u0439 u043f u043b u043b u0435 u043d u043a和每个方向 u043f u043e u0441 u0442 u043e u00a0 u043d u043d u043e u0433 u043e磁性 u043f u043e u043b u00a0 u0438 u0437 u043c u0435 u0440 u0440 u00a u044e u0442频率 u0441 u0438 u043d u043e u0432 u044b u0445与minimiz对应的波样品所反映的高频功率的频率依赖性 u0438 u0441 u0441 u043b u0435 u0434 u0443 u0435 u043c u043e u0442 u043e和薄膜的预期参数 u043e u043f u0440 u0435 u0434 u0435 u043b u00a0 u044e u0442在 u0437 u043d u0430 u0447 u0435 u043d u0438 u00a0 u043c上通过分散 u0441 u043e u043e u0442 u043d u043e 0043测得的频率u0435 u043d u0438 u0439.2 il。

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