首页> 外国专利> thermostatisierte arrangement for safe and controlled evaporation of the air toxic or highly reactive liquid reaktionsmedien, preferably for niederdruckdampfabscheideanlagen in semiconductor technology.

thermostatisierte arrangement for safe and controlled evaporation of the air toxic or highly reactive liquid reaktionsmedien, preferably for niederdruckdampfabscheideanlagen in semiconductor technology.

机译:恒温装置,用于安全,可控地蒸发有毒或高反应性液体,尤其是半导体技术中的niederdruckdampfabscheideanlagen。

摘要

A thermostatic vaporiser device for the safe and controlled vaporisation of liquid reaction media which are toxic and/or highly reactive in air, especially for low-pressure vapour discharge systems in semiconductor technology, is characterised in that the carrier gas inlet valves (3, 5) and outlet valves (4, 6) fitted in the cover (2) can be shut off and have different standard sizes, that moreover a valve (11) and/or a filling branch for filling the vaporiser (1) and for a level indicator (12) are provided in the cover (2), a measurement system (12) for indicating the level being integrated in the cover (2). The vaporiser device is preferably used in circuit board chemical vapour deposition units for the deposition of doped and undoped insulation layers and contact metal layers and for etching processes. As compared with the commercially available vaporiser vessels, it is distinguished by higher safety and better control of the vaporisation. IMAGE
机译:一种用于安全和受控地蒸发在空气中有毒和/或高反应性的液体反应介质的恒温蒸发器设备,特别是对于半导体技术中的低压蒸气排放系统,其特征在于,载气入口阀(3,5 )和安装在盖子(2)中的出口阀(4、6)可以关闭,并具有不同的标准尺寸,此外还包括阀(11)和/或用于填充汽化器(1)和液位的填充支路指示器(12)设置在盖子(2)中,测量系统(12)用于指示被集成在盖子(2)中的液位。蒸发器装置优选用于电路板化学气相沉积单元中,以沉积掺杂和未掺杂的绝缘层和接触金属层以及用于蚀刻工艺。与市售的蒸发器容器相比,其特点是更高的安全性和更好的蒸发控制。 <图像>

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