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Ultra-thin high dose iridium source for remote afterloader

机译:超薄高剂量铱源,用于远程后装

摘要

An ultra-thin iridium source is used for the treatment of cancerous tissue, particularly in areas of the human body, such as the brain, where minimization of trauma to adjacent tissue is a high priority. The source is formed of a relatively pure iridium seed encapsulated in the end region of a relatively pure unitary platinum delivery wire. The relatively pure iridium source is irradiated to a high activity level (e. g. 10 curie) even though having a short overall length (e.g. 10 millimeter) and ultra-thin diameter (e.g. about 1/8 millimeter). The platinum delivery wire defines a substantially uniform ultra-thin cross section of approximately 0.5 millimeter diameter. The iridium source is formed within the unitary platinum delivery wire without resort to welding or other inherently unreliable attachment systems. Delivery of the high activity pure iridium source to treatment area is achieved using remote afterloader equipment.
机译:超薄铱源用于治疗癌性组织,特别是在人体区域(如大脑)中,对周围组织的创伤最小化是当务之急。源由封装在相对纯的一体式铂传输线的端部区域中的相对纯的铱种子形成。即使具有短的全长(例如10毫米)和超薄的直径(例如约1/8毫米),也将相对纯的铱源辐射到高活性水平(例如10居里)。铂传输线限定了大约0.5毫米直径的基本均匀的超薄横截​​面。铱源形成在单一的铂输送丝内,而无需借助焊接或其他固有不可靠的连接系统。使用远程后装设备将高活性纯铱源输送到治疗区域。

著录项

  • 公开/公告号US5084002A

    专利类型

  • 公开/公告日1992-01-28

    原文格式PDF

  • 申请/专利权人 OMNITRON INTERNATIONAL INC.;

    申请/专利号US19880228400

  • 发明设计人 SAMUEL F. LIPRIE;

    申请日1988-08-04

  • 分类号A61N5/00;

  • 国家 US

  • 入库时间 2022-08-22 05:23:24

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