首页>
外国专利>
Cleaning of CVD reactor used in the production of polycrystalline silicon by impacting with carbon dioxide pellets
Cleaning of CVD reactor used in the production of polycrystalline silicon by impacting with carbon dioxide pellets
展开▼
机译:通过与二氧化碳颗粒撞击来清洁用于生产多晶硅的CVD反应器
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention is a process for the cleaning of the inner surfaces of a chemical vapor deposition reactor used in the production of polycrystalline silicon. The process comprises impacting the surfaces to be cleaned with solid carbon dioxide pellets. The carbon dioxide pellets dislodge silicon deposits from the surface of the reactor without damaging the surface of the reactor and without providing a source for contamination of polycrystalline silicon produced in the cleaned reactor. The present process is particularly useful for the cleaning of the inner surfaces of chemical vapor deposition reactors used in the production of semi-conductor grade silicon.
展开▼