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Method for manufacturing a read only memory device using a focused ion beam to alter superconductivity

机译:使用聚焦离子束改变超导性的只读存储器件的制造方法

摘要

A read only memory device comprises a first electrode, and a second electrode arranged overlapping with the first electrode so as to be geometrically in connection at the intersection. At least one of the first and second electrodes is formed of a ceramics system high temperature superconductor. A prescribed electrode out of said electrodes which is formed of the high temperature superconductor has a high resistance region for insulating the first and second electrodes from each other at the intersection corresponding to a prescribed stored data. PPIn the manufacturing method, the first and second electrodes are formed and, thereafter, a high resistance region is formed by irradiating focused ion beam.
机译:只读存储设备包括第一电极和第二电极,第二电极布置成与第一电极重叠,从而在交叉点处几何连接。第一和第二电极中的至少一个由陶瓷系统高温超导体形成。由高温超导体形成的所述电极中的规定电极具有高电阻区域,该高电阻区域用于在与规定存储数据相对应的交点处使第一电极和第二电极彼此绝缘。

在该制造方法中,形成第一电极和第二电极,然后,通过照射聚焦的离子束来形成高电阻区域。

著录项

  • 公开/公告号US5130273A

    专利类型

  • 公开/公告日1992-07-14

    原文格式PDF

  • 申请/专利权人 MITSUBISHI DENKI KABUSHIKI KAISHA;

    申请/专利号US19910642246

  • 发明设计人 TADASHI NISHIOKA;YOJI MASHIKO;

    申请日1991-01-07

  • 分类号H01L21/42;G11C11/44;G11C11/065;

  • 国家 US

  • 入库时间 2022-08-22 05:22:36

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