MANUFACTURE OF VACUUM CHAMBER IN CVD APPARATUS AND DRY ETCHING APPARATUS

摘要

PURPOSE:To reduce the weight of an apparatus and to improve the heat conductivity by forming anodic oxide films on a box-shaped Al body and an Al lid for a vacuum chamber and evaporating and removing water by heat treatment. CONSTITUTION:Anodic oxide films are formed on at least the insides of a box-shaped Al body and an Al lid for a vacuum chamber with an oxalic acid soln. or the like. The thickness of the films is about 0.5-20mum. Heat treatment is then carried out at about 100-150 deg.C for about 5-20hr to evaporate and remove water adsorbed on the anodic oxide films. By this method, a vacuum chamber having satisfactory heat conductivity can simply be manufactured at a low cost. The resistance of the vacuum chamber to corrosion by gases used in CVD and dry etching are comparable to or higher than that of a stainless steel vacuum chamber.