首页> 外国专利> MANUFACTURE OF POLYSILANES AND POLYGERMANES AND VAPOR DEPOSITION OF HYDROGENATED AMORPHOUS SILICON, ALLOY OF SAME AND HYDROGENATED AMORPHOUS GERMANIUM

MANUFACTURE OF POLYSILANES AND POLYGERMANES AND VAPOR DEPOSITION OF HYDROGENATED AMORPHOUS SILICON, ALLOY OF SAME AND HYDROGENATED AMORPHOUS GERMANIUM

机译:加氢非晶硅,相同和加氢非晶锗合金的多晶硅和多晶的制造以及气相沉积

摘要

A process is provided for forming high purity polysilanes or polygermanes by electric discharge wherein the monosilane or monogermane is provided in a gaseous mixture with a carrier gas at atmospheric pressure. The polysilanes or polygermanes produced at atmospheric pressure are further deposited by various means onto a substrate as hydrogenated amorphous silicon or germanium. The polysilane may also be used for the deposition of hydrogenated amorphous silicon alloys.
机译:提供了一种用于通过放电形成高纯度聚硅烷或聚锗烷的方法,其中在大气压力下以与载气的气态混合物形式提供甲硅烷或单锗烷。在大气压力下产生的聚硅烷或聚锗烷进一步通过各种方式沉积为氢化非晶硅或锗的基材。聚硅烷也可以用于沉积氢化非晶硅合金。

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