DIAMOND FILM SYNTHESIS DEVICE BY MICROWAVE PLASMA CVD METHOD

摘要

PURPOSE: To synthesize a diamond film of uniform film thickness on a substrate with large area by installing a microwave introducing window with its center eccentric to that of a reactor and tuning a substrate stand. ;CONSTITUTION: A microwave introducing window 12 is eccentrically fitted to a reaction chamber 13. Plasma 20 is excited and formed just below the microwave introducing window 12 by a microwave introduced from a microwave horn 11. A substrate 17 is concentrically placed in the reaction chamber 13. The plasma 20 is located above the off-center part of the substrate 17 and a diamond film is formed on the substrate 17 by centering the offset place from the center of the substrate 17. When a substrate stand 16 is tuned by a rotating mechanism 19, the formation of the diamond film is averaged. Thereby a uniform diamond film is formed on a substrate of large area.;COPYRIGHT: (C)1993,JPO&Japio