首页> 外国专利> MANUFACTURE OF ELECTRONIC DEVICE USING LI2B4O7 SINGLE CRYSTAL

MANUFACTURE OF ELECTRONIC DEVICE USING LI2B4O7 SINGLE CRYSTAL

机译:使用Li2B4O7单晶制造电子器件

摘要

PURPOSE:To enhance adhesion between a crystal and an electrode when an electronic device is to be manufactured using the lift-off method by a method wherein the device is immersed in a surface stabilizing atmosphere after pretreatment is finished. CONSTITUTION:Mirror polishing is performed to one side of a thin plate 1 cut out from a crystal. Then the plate is immersed in hot Trichlene as pretreatment to remove dirt, fats and oils, etc. on the surface, Trichlene is replaced with alcohol, and rotary drying is performed. Then it is immersed in ethyl alcohol mixed with hydrogen fluoride, alcohol is replaced with pure ethyl alcohol, and rotary drying is performed to stabilize the surface. After then, a resist 3 is applied and dried. Then it is immersed in a surface hardening agent, and rotary drying is performed to harden 4 only the surface. Exposure is performed using a reversal mask, exposure is performed, and development is performed using a developer. After then, an Al layer 5 is formed in a vacuum evaporation device holding the temperature as not to rise to 850 deg.C or more. Then it is immersed in acetone or ethyl alcohol, and lifting off is performed.
机译:目的:当采用剥离方法通过在预处理完成后将器件浸入表面稳定气氛中的方法制造电子器件时,增强晶体与电极之间的粘合力。组成:对从晶体切出的薄板1的一侧进行镜面抛光。然后将板浸入热的Trichlene中作为预处理以去除表面上的污垢,油脂等,将Trichlene替换为酒精,然后进行旋转干燥。然后将其浸入与氟化氢混合的乙醇中,用纯乙醇代替乙醇,并进行旋转干燥以稳定表面。然后,施加抗蚀剂3并干燥。然后,将其浸入表面硬化剂中,并进行旋转干燥以仅硬化表面4。使用反转掩模进行曝光,进行曝光,并且使用显影剂进行显影。此后,在真空蒸发装置中形成Al层5,保持温度不升高到850℃或更高。然后将其浸入丙酮或乙醇中,并进行剥离。

著录项

  • 公开/公告号JPH0526332B2

    专利类型

  • 公开/公告日1993-04-15

    原文格式PDF

  • 申请/专利权人 TOKYO SHIBAURA ELECTRIC CO;

    申请/专利号JP19830051446

  • 发明设计人 FUKUDA KATSUYOSHI;MATSUMURA SADAO;

    申请日1983-03-29

  • 分类号H01P3/16;H01L21/306;

  • 国家 JP

  • 入库时间 2022-08-22 05:18:56

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