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METALLIC CONDUCTIVE FOIL OR METALLIC ALLOY CONDUCTIVE FOIL AND MANUFACTURE THEREOF

机译:金属导电箔或金属合金导电箔及其制造

摘要

PURPOSE: To provide conductive foil high in the joining strength of a solder joint part and free from the generation of soldering balls. ;CONSTITUTION: In the objective metallic conductive foil or metallic alloy conductive foil, a solder film 50 with 1 to 50μm thickness constituted in such a manner that plural lead layers 31 and 32 and tin layers 41 and 42 are alternately laminated is formed on the surface 21 of foil body 20 constituted of metal or alloy essentially consisting of the metal. At the time of using one kind selected from gold, silver, platinum and palladium as the above-mentioned metal, the thickness of the solder film is regulated to 3 to 50μm, and at the time of using lead as the above-mentioned metal, the thickness of the solder film is regulated to l to 30μm as well as the thickness of the layer constituted of the adjacent one lead layer and tin layer is regulated to ≤8μm. Moreover, the objective conductive foil is manufactured by a vacuum deposition method.;COPYRIGHT: (C)1993,JPO&Japio
机译:目的:提供一种导电箔,该箔具有较高的焊点接合强度,并且不会产生焊球。 ;构成:在目标金属导电箔或金属合金导电箔中,在其表面形成厚度为1至50μm的焊料膜50,该焊料膜以交替层叠多个引线层31和32和锡层41和42的方式构成箔片主体20的图21所示的箔片主体21由基本上由金属组成的金属或合金构成。在使用选自金,银,铂和钯中的一种作为上述金属时,将焊料膜的厚度调节为3至50μm,并且在使用铅作为上述金属时,焊料膜的厚度为1〜30μm,相邻的一个引线层和锡层构成的层的厚度为≤8μm。另外,通过真空蒸镀法制造目标导电箔。版权所有:(C)1993,日本特许厅

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