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OPTICAL WAVEGUIDE DEVICE OF LINBO3 THIN FILM AND PRODUCTION THEREOF

机译:LINBO3薄膜的光学波导装置及其生产

摘要

PURPOSE: To allow the guiding of only the ordinary light of the short wavelength region light of visible light or the extraordinary light as well with high efficiency by forming the optical waveguide of the LiNbO3 thin film on an LiNbO3 substrate by liquid phase epitaxy. ;CONSTITUTION: The optical waveguide 2 of the LiNbO. thin film which is not doped with MgO or is doped with a small quantity of the MgO or is properly doped with ZnO is formed on the LiNbO3 substrate 1 doped with MgO by liquid phase epitaxy(LPE) using a melt selected to attain about ≥0.985 Li/Nb and about ≤1.04 Li/Nb of the range where good crystallinity is obtainable in such a manner that a refractive index ne attains the refractive index of the substrate 1 or below. The doping quantity of the MgO of the substrate 1 is selected from 0.1 to 10mol%. The LPE of the optical waveguide 2 of the LN thin film is executed by using an Li2O-2O3, flux. An LN substrate layer and the optical waveguide 12 of the LN thin film are successively formed by LPE on the LN substrate and the quantity of the Li in the substrate layer is set larger than in the waveguide 12.;COPYRIGHT: (C)1993,JPO&Japio
机译:目的:通过在LiNbO上形成LiNbO 3 薄膜的光波导,从而仅高效率地引导可见光或异常光的短波长区域光中的普通光。液相外延法制备 3 底物。 ;组成:LiNbO的光波导2。利用液相外延法(LPE),在掺杂有MgO的LiNbO 3 衬底1上形成未掺杂MgO或掺杂有少量MgO或适当掺杂有ZnO的薄膜。选择一种熔融物,使其达到约0.985Li / Nb且≤≤1.04Li/ Nb,所述熔融物以使折射率ne达到基板1的折射率以下的方式可获得良好的结晶性。基板1的MgO的掺杂量为0.1〜10mol%。 LN薄膜的光波导2的LPE通过使用Li 2 O- 2 O 3 通量来执行。通过LPE在LN衬底上依次形成LN衬底层和LN薄膜的光波导12,并且将衬底层中的Li的量设定为大于波导12中的Li的量。COPYRIGHT:(C)1993,日本特许厅

著录项

  • 公开/公告号JPH0566315A

    专利类型

  • 公开/公告日1993-03-19

    原文格式PDF

  • 申请/专利权人 SONY CORP;

    申请/专利号JP19920023980

  • 发明设计人 YAMADA ATSUO;SAITO MAKI;TAMADA HITOSHI;

    申请日1992-02-10

  • 分类号G02B6/12;G02F1/035;G02F1/313;

  • 国家 JP

  • 入库时间 2022-08-22 05:16:29

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