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PRODUCTION OF HIGH-QUALITY OXIDE SUPERCONDUCTOR THIN FILM

机译:高质量氧化物超导体薄膜的生产

摘要

PURPOSE:To stably produce a high quality oxide superconductor thin film by heating the raw material powder of the superconductor thin film under a high vacuum below a temperature at which the oxide superconductor constituting the thin film takes in oxygen. CONSTITUTION:In a method for producing an oxide superconductor thin film from a powdery raw material oxide, the raw material oxide powder is subjected to heat treatment under a high vacuum at a temperature which is lower than the temperature at which the oxide superconductor constituting the thin film takes in oxygen by =100 deg.C, and subsequently formed into the thin film. The method is performed under a high vacuum free from a residual substance which reacts into a pollutant, and prevents the generation of new pollution caused by a residual gas in the vacuum which reacts with the raw material oxide into a pollutant. Heating must be carried out under a vacuum of =1X10-9, because heating under a higher pressure will generate new pollution.
机译:目的:通过在高真空下将超导体薄膜的原料粉末加热到低于构成该薄膜的氧化物超导体吸收氧气的温度,来稳定地生产高质量的氧化物超导体薄膜。组成:在由粉末状原料氧化物生产氧化物超导体薄膜的方法中,原料氧化物粉末在高真空下进行热处理,该温度低于构成薄氧化物的氧化物超导体的温度薄膜在<= 100℃下吸收氧气,随后形成薄膜。该方法在高真空下进行,其中没有残留物质,该残留物质反应成污染物,并防止由真空中与原料氧化物反应成污染物的残留气体引起的新污染的产生。加热必须在<= 1X10 <-9>的真空下进行,因为在较高压力下加热会产生新的污染。

著录项

  • 公开/公告号JPH054805A

    专利类型

  • 公开/公告日1993-01-14

    原文格式PDF

  • 申请/专利权人 SUMITOMO ELECTRIC IND LTD;

    申请/专利号JP19910180226

  • 发明设计人 SAKAMOTO TAKESHI;IIYAMA MICHITOMO;

    申请日1991-06-25

  • 分类号C01B13/14;C01G1/00;C04B35/00;H01B13/00;H01L39/24;

  • 国家 JP

  • 入库时间 2022-08-22 05:13:15

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