METHOD OF FINE PHOTOETCHING WORK FOR METALLIC MATERIAL AND METALLIC MATERIAL FOR FINE PHOTOETCHING WORK

摘要

PURPOSE:To carry out fine photoetching work minimal in the amount of side etching by etching a metallic material prepared by joining a layer of an alloy having an Ni content larger than that in an undermentioned alloy to a layer of soft steel or Fe-Ni alloy by using an aqueous solution of FeCl3. CONSTITUTION:A layer of an alloy containing Fe and Ni by =30% and also containing Ni by the amount larger by =20% than the amount of Ni contained in an undermentioned primary alloy layer or a layer of a secondary alloy composed principally of Ni is joined by one or more layers to one side or both sides of a layer of soft steel or primary alloy containing Fe and Ni by =50%. At this time, stainless steel can be used for the secondary alloy layer. Further, the above joining is carried out by means of cladding, such as explosion bonding, pressure welding, and diffusion joining, thermal spraying, vapor deposition plating, etc. The resulting metallic material composed of multilayered joined material is subjected to photoetching work by using an aqueous solution of FeCl3 as an etchant. At this time, corrosion protective effect can be produced by the galvanic action of the joined dissimilar metals. By this method, the amount of side etching can be reduced, and fine photoetching work can be performed.