首页> 外国专利> METHOD FOR MANUFACTURING SUPERCONDUCTING DEVICE HAVING A SUPERCONDUCTING LAYER FORMED OF AN OXIDE SUPERCONDUCTOR AND A NONSUPERCONDUCTING LAYER FORMED ON THE SUPERCONDUCTING LAYER

METHOD FOR MANUFACTURING SUPERCONDUCTING DEVICE HAVING A SUPERCONDUCTING LAYER FORMED OF AN OXIDE SUPERCONDUCTOR AND A NONSUPERCONDUCTING LAYER FORMED ON THE SUPERCONDUCTING LAYER

机译:具有具有由氧化物超导体构成的超导层和由超导体层构成的非超导层的制造超导器件的方法

摘要

For manufacturing a superconducting device, a ?-axis orientated oxide superconductor layer is formed on a surface of the substrate and at least one layer which is not composed of an oxide superconductor is formed on the ?-axis orientated oxide superconductor layer. The ?-axis orientated oxide superconductor layer is etched so that at least one side surface of the ?-axis orientated oxide superconductor layer exposed. Then, the substrate is heated in an O2 atmosphere, an O2 atmosphere including O3 or an O3 atmosphere, so that oxygen penetrates into the ?-axis orientated oxide superconductor layer from the exposed side surface. An .alpha.-axis orientated oxide superconductor thin film is formed so as to cover the exposed side surface of the ?-axis orientated oxide superconductor layer.
机译:为了制造超导器件,在基板的表面上形成α轴取向的氧化物超导体层,并且在α轴取向的氧化物超导体层上形成至少一层不由氧化物超导体构成的层。蚀刻α轴取向的氧化物超导体层,以使β轴取向的氧化物超导体层的至少一个侧面露出。然后,在O 2气氛,包括O 3的O 2气氛或O 3气氛中加热基板,以使氧从暴露的侧面渗透到α轴取向的氧化物超导体层中。形成α轴取向的氧化物超导体薄膜,以覆盖α轴取向的氧化物超导体层的露出的侧面。

著录项

  • 公开/公告号CA2070340A1

    专利类型

  • 公开/公告日1993-01-03

    原文格式PDF

  • 申请/专利权人 SUMITOMO ELECTRIC INDUSTRIES LTD.;

    申请/专利号CA19922070340

  • 发明设计人 IIYAMA MICHITOMO;TANAKA SO;

    申请日1992-06-03

  • 分类号H01L39/24;

  • 国家 CA

  • 入库时间 2022-08-22 05:08:35

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