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Method for manufacturing superconducting device having a superconducting layer formed of an oxide superconductor and a nonsuperconducting layer formed on the superconducting layer

机译:具有由氧化物超导体形成的超导层和形成在该超导层上的非超导层的超导器件的制造方法

摘要

For manufacturing a superconducting device, a c-axis orientated oxide superconductor layer is formed on a surface of the substrate and at least one layer which is not composed of an oxide superconductor is formed on the c-axis orientated oxide superconductor layer. The c-axis orientated oxide superconductor layer is etched so that at least one side surface of the c-axis orientated oxide superconductor layer exposed. Then, the substrate is heated in an O₂ atmosphere, an O₂ atmosphere including O₃ or an O₃ atmosphere, so that oxygen penetrates into the c-axis orientated oxide superconductor layer from the exposed side surface. An a-axis orientated oxide superconductor thin film is formed so as to cover the exposed side surface of the c-axis orientated oxide superconductor layer.
机译:为了制造超导器件,在基板的表面上形成c轴取向的氧化物超导体层,并且在c轴取向的氧化物超导体层上形成至少一层不由氧化物超导体构成的层。蚀刻c轴取向的氧化物超导体层,以使c轴取向的氧化物超导体层的至少一个侧面露出。然后,在O 2气氛,包括O 3的O 2气氛或O 4气氛中加热衬底,以使氧从暴露的侧面渗入c轴取向的氧化物超导体层。形成a轴取向的氧化物超导体薄膜,以覆盖c轴取向的氧化物超导体层的露出的侧面。

著录项

  • 公开/公告号EP0521765A2

    专利类型

  • 公开/公告日1993-01-07

    原文格式PDF

  • 申请/专利权人 SUMITOMO ELECTRIC INDUSTRIES LTD.;

    申请/专利号EP19920401841

  • 发明设计人 TANAKA SO;IIYAMA MICHITOMO;

    申请日1992-06-29

  • 分类号H01L39/22;H01L39/24;

  • 国家 EP

  • 入库时间 2022-08-22 05:05:59

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