首页>
外国专利>
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF OXIDE FILM STACK
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF OXIDE FILM STACK
展开▼
机译:等离子体增强化学气相沉积膜的化学气相沉积
展开▼
页面导航
摘要
著录项
相似文献
摘要
A plasma enhanced chemical vapor deposition method is provided for depositing an oxide film onto a substrate surface. Deposition is achieved even onto a surface of a glass or other relatively non-receptive substrate. A sub-film is deposited under plasma enhanced chemical vapor deposition conditions more strongly favoring deposition, followed by deposition of the desired oxide film under second plasma enhanced chemical vapor deposition conditions less strongly favoring deposition. High quality oxide films can be achieved by deposition at second plasma enhanced chemical vapor. deposition conditions only marginally favoring deposition over etching.
展开▼