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X-ray mask structure, preparation thereof and X-ray exposure method

机译:X射线掩模结构,其制备和X射线曝光方法

摘要

An X-ray mask structure comprises an X-ray transmissive film, an X-ray absorptive member held on the X-ray transmissive film and supporting frame for supporting the X-ray transmissive film. The X-ray absorptive member is constituted of crystalline grains having a grain boundary size of 1µm or larger, or has a density of 90% or more relative to the density of the bulk material.
机译:X射线掩模结构包括:X射线透射膜;保持在X射线透射膜上的X射线吸收构件;以及用于支撑X射线透射膜的支撑框架。 X射线吸收部件由晶界尺寸为1μm以上的晶粒构成,或者相对于块状材料的密度具有90%以上的密度。

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