Mounting method of target plate cooled in vacuum process chamber and target plate device, target plate and vacuum chamber

摘要

The present invention relates to a mounting method of a target plate used for performing sputtering or deposition in a vacuum process chamber and a fixing structure of the target plate and the chamber wall. The present invention is such that the coupling between the two constituent members is achieved through bayonet locks on the central and peripheral portions of the target plate and the chamber wall for fixing between the target plate and the chamber wall into which the target plate is inserted and fixed.;The present invention has the advantage that it is easy to form a good coating layer on the surface of the workpiece and to easily replace the target plate by taking a structure that simply fixed in the chamber wall without using a separate mounting member for mounting the target plate. .