METHOD OF MOUNTING A TARGET PLATE TO BE COOLED INTO A VACUUM PROCESS CHAMBER, AN ARRANGEMENT OF A TARGET PLATE, A TARGET PLATE AND A VACUUM CHAMBER

摘要

PURPOSE: A method of mounting a target plate is provided, an arrangement of a target plate to be cooled, and a vacuum process chamber wherein the target plate is to be installed is provided, and a target plate and a vacuum chamber are provided. CONSTITUTION: The process chamber arrangement for a vacuum process comprises a cooling plate(14) having at least one channel(16) thereon for containing a cooling medium; a heat conducting membrane(18) placed over each channel; a target plate(10) engageable with the cooling plate over the heat conducting membranes for operating in the vacuum process; and bayonet locking means for locking the target plate to the cooling plate by limited relative axial and rotational movement between the plates. The method of mounting a vacuum process arrangement comprises providing a cooling plate having at least one channel thereon and having at least one bayonet locking means; placing a heat conducting membrane over each channel of the cooling plate; providing a target having at least one bayonet locking means; locking the target plate to the cooling plate over the channels by engaging the bayonet locking means of the target plate with the bayonet locking means of the cooling plate by limited relative axial and rotational movement between the plates; introducing a cooling medium in the channels of the cooling plate; and pressurizing the cooling medium.