METHOD OF PRODUCING AMORPHOUS METALLIC FILMS

摘要

Use: manufacturing techniques of film elements in electronic and optical devices on the solid. Summary of the Invention: Preparation of amorphous metal films is achieved by suppressing the surface migration ada- volumes during sputtering target layer adsorbed gas not reactive with the film material. The target is vaporized by pulses of laser radiation in an inert gas environment. Desorption gas before depositing each new batch of metal is accomplished by bombardment of the surface vysokoenergeti- chnymi laser plasma electrons and ions. The method eliminates the need for forced cooling of the substrate to a temperature below the transition temperature of the amorphous phase - crystal and allows to expand the class of substances, which can be obtained from amorphous films. Table 1. 2 yl.