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BIEXPOSURE HOLOGRAPHIC INTERFEROGRAM RECORDING METHOD

机译:双曝光全息图记录方法

摘要

The invention relates to measuring equipment and holographic interferometry. The purpose of the invention - illumination of one and the same surface region at the hologram recording. The invention allows to obtain a double-exposure hologram, the interference pattern from which can be determined a surface topograph of objects with high accuracy. The object beam illuminates coherent light and recording its hologram on a photographic plate. Then, alter the angle of incidence of the illuminating beam on the surface of the object and a second hologram is recorded on the same photographic plate of the same object. Wherein the beam is rotated about an axis lying in the plane of the object surface and passing through the point of incidence of the illuminating beam on the surface of the object. This is achieved by using the properties of the sinus linkage. Thus during recording of the hologram is provided by illumination of the same portion on the surface obekta.3 yl. There are a number of methods for measuring surface topography: 1 immersion method two wavelengths 2 and biased source method. In the methods of the above registration is provided a two holograms of the object on the same photographic plate with different refractive indices ni and nj fe Os 00 00 SC with w w
机译:本发明涉及测量设备和全息干涉术。本发明的目的是在全息图记录中照射一个和相同的表面区域。本发明允许获得双曝光全息图,可以从该全息图确定干涉图案,从而高精度地确定物体的表面形貌。物光束照射相干光并将其全息图记录在照相板上。然后,改变照明光束在物体表面上的入射角,并在同一物体的同一照相板上记录第二张全息图。其中光束绕着位于物体表面的平面中的轴线旋转,并穿过照明光束在物体表面上的入射点。这可以通过使用窦房结的属性来实现。因此,在全息图的记录期间,通过表面obeta 3yl上相同部分的照射来提供全息图。测量表面形貌的方法有很多种:1浸入法和两种波长2和偏置光源法。在上述配准方法中,提供了在同一张照相板上的两个全息图,其具有不同的折射率ni和nj fe Os 00 00 SC,w w

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