Radiation sensitive compsn. for photoresist in accurate UV and X=ray process - contg. modified maleic anhydride polymer and acid forming agent with high resolution and sensitivity for highly integrated circuit prodn.

摘要

The compsn. contains a polymer (I) with recurring maleate units of formula (I), R1 = substd. (m)ethyl, silyl, germyl or alkoxycarbonyl, R2 = -OR3 or -NR4R5, R3 = H, linear or cyclic alkyl, aryl, aralkyl, substd. (m)ethyl, silyl, germyl or alkoxycarbonyl and R4 and R5 = H, linear or cyclic alkyl, aralkyl or aryl, and a radiation-sensitive acid-forming agent (II). Pref. substd. methyl = a methylthiomethyl, methoxy(ethoxy)methyl, tetrahydro(thio)pyranyl, tetrahydro(thio)furanyl, benzyloxymethyl, (bromo)phenacyl, methoxyphenylacyl, alpha-methylphenacyl, cyclopropylmethyl, cyclopentyl, cyclohexyl, benzyl, tri- or di-phenylmethyl, bromo, nitro or methoxy benzyl, piperonyl or furfuryl gp., substd. ethyl = a 1-(m)ethoxyethyl, i-Pr, t-Bu or 1,1-dimethylpropyl gp., silyl and germyl = a tri(m)ethyl-, t-butyldimethyl-, isopropyldimethyl- or phenyldimethyl-silyl or -germyl gp., alkoxycarbonyl = (m)ethoxy- or t-butoxy-carbonyl, linear alkyl = Me, Et, n-Pr or n-Bu, cyclic alkyl - cyclopentyl or cyclohexyl, aryl = phenyl, naphthyl or tolyl, and aralkyl (alpha-methyl)benzyl, diphenylmethyl or trityl. USE/ADVANTAGE - X-ray and electron radiation e.g. in the prodn. of highly integrated circuits. It has high sensitivity, high resolution, good dry etching and development properties, high adhesion and high thermal stability.