Projection exposure appts. for LSI mfr. - has light source and annular illumination distributor, arranging light beams on plane of effective source

摘要

The projection exposure appts. images a fine pattern with a high contrast and large depth sharpness. It has a light source and an illumination distributor with an annular shape w.r.t. an optical axis of the light beams of the source on the plane of an effective source (5). An illumination optical system (6) guides the light from the effective source plane onto a mask (1) with a preset pattern. The latter is projected onto a resist film by a lens system (2). The light permeation reduction device (4) reduces the light passage through a first region, as compared with a second one in the pupil plane of the projector. USE/ADVANTAGE - For fine circuit pattern of LSI, etc., using a photoreceptor process, with increased resolution.