首页> 外国专利> Electroless gold plating solution, method of plating with gold by using the same, and electronic device plated with gold by using the same

Electroless gold plating solution, method of plating with gold by using the same, and electronic device plated with gold by using the same

机译:化学镀金溶液,使用其镀金的方法以及使用其镀金的电子设备

摘要

The present invention relates to an electroless gold plating solution, a method of plating by using the same, and an electronic device plated with gold by using the same.PPAccording to the present electroless gold plating solution, the plating solution components contain no cyanide ions, the amount of a reducing agent used is small, and gold plating can be carried out without causing the gold plating on conducting paths having a fine interval between them to short- circuit the conducting paths.PPTherefore, according to the method of gold plating by using said electroless gold plating solution, a plating method that is safe in the plating work and in the treatment of its waste liquor can be accomplished. The method has a feature that the method can provide an electronic device on which parts can be mounted highly densely, and wherein the joint reliability to the parts is high.
机译:化学镀金液,其镀覆方法以及电子设备技术领域本发明涉及一种化学镀金液,其镀覆方法以及使用该镀金的电子设备。根据本发明的化学镀金液,该镀覆液组分不包含氰化物离子,还原剂的用量少,并且可以进行镀金而不会导致在它们之间具有精细间隔的导电路径上的镀金使导电路径短路。

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