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Method for dimensionally accurate structure transfer in bilayer technique wherein a treating step with a bulging agent is employed after development
Method for dimensionally accurate structure transfer in bilayer technique wherein a treating step with a bulging agent is employed after development
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机译:在双层技术中进行尺寸精确的结构转移的方法,其中显影后采用鼓胀剂处理步骤
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摘要
A photolithographic method for structure generation in bilayer processes is provided. Pursuant to the method, a dimensional reserve is produced in a top resist structure by chemical treatment with a bulging agent. The expansion preferably is performed by treatment with an aqueous solution. The expansion can be set such that the dimensional loss to be anticipated in further etchings of the bottom resist or, respectively, of the wafer is exactly compensated for.
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