首页> 外国专利> PROCESSING LIQUID FILTERING MECHANISM FOR AUTOMATIC DEVELOPING MACHINE

PROCESSING LIQUID FILTERING MECHANISM FOR AUTOMATIC DEVELOPING MACHINE

机译:自动显影机的液体过滤机理

摘要

PURPOSE: To provide the processing liquid filtering mechanism for an automatic developing machine capable of removing sludge of fine particles without decreasing the capacity to stir the developer. ;CONSTITUTION: A first filter 80 of a first circulation system 70 is formed to the size of the meshes to exclusively remove the sludge of somewhat large sizes in the developer, hardly clogs, generates a pressure drop in this section and does not degrade the capacity to stir the developer. A separately provided second filter 106 which is fitted into a drain port 108 of a second circulation system 72 is formed to the size smaller than the size of the meshes of the first filter 80 and a third filter 104 is formed to the size smaller than the mesh size of the second filter 106. The sludge which is not completely removed by the first filter 80 is removed by the second filter 106 and only the sludge finer than the size of the meshes of the second filter 106 is removed by the third filter 104 and, therefore, the clogging rate is low.;COPYRIGHT: (C)1994,JPO&Japio
机译:目的:提供一种用于自动显影机的处理液过滤机构,该机构能够去除细小颗粒的污泥而不会降低搅拌显影剂的能力。组成:第一循环系统70的第一过滤器80形成为筛孔大小,以专门去除显影剂中较大尺寸的污泥,几乎不会堵塞,在此部分产生压降,并且不会降低容量搅拌显影剂。装配到第二循环系统72的排出口108中的单独提供的第二过滤器106形成为小于第一过滤器80的筛孔的尺寸,而第三过滤器104形成为小于第一过滤器80的筛孔的尺寸。第二过滤器106的网眼尺寸。第二过滤器106去除未被第一过滤器80完全去除的污泥,第三过滤器104仅去除比第二过滤器106的网眼细的污泥。 ;因此,堵塞率很低。;版权所有:(C)1994,日本特许厅和日本apio

著录项

  • 公开/公告号JPH06130621A

    专利类型

  • 公开/公告日1994-05-13

    原文格式PDF

  • 申请/专利权人 FUJI PHOTO FILM CO LTD;

    申请/专利号JP19920278916

  • 发明设计人 SAOTOME SHIGERU;

    申请日1992-10-16

  • 分类号G03D3/02;G03D3/06;

  • 国家 JP

  • 入库时间 2022-08-22 04:53:55

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