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WEAR RESISTANT HARD FILM OF AL-TI OR AL-TA SYSTEM AND ITS PRODUCTION

机译:AL-TI或AL-TA系统的耐磨硬膜及其生产

摘要

PURPOSE: To inexpensively produce the dense and high-hardness wear resistant film which well adheres tightly to a base material by simple stages without generating the cracking and peeling of the film formed on the base material at the boundary thereof even if the film is formed without preheating the base material prior to coating. ;CONSTITUTION: The film is formed on the base material in an inert gaseous atmosphere by a sputtering method or ion plating method using an evaporating source material having the compsn. expressed by AlaTib (where 62at%≤a≤85 at.%, 15at.%≤b≤38at.%, and a+b=100at.%) or AlcTad (where 60at.%≤c≤80 at.%, 20at.%≤d≤40at.%, and c+d=100at.%) while continuously or stepwise changing the supply rate of reactive gases of a nitrogen system. The wear resistant hard film which is changed in the compsn. and structure gradiently from the substantially amorphous metal of the above-mentioned compsn. to an (Al, Ti)N or (Al, Ta)N crystalline ceramic phase toward the film surface is obtd. by this method.;COPYRIGHT: (C)1994,JPO&Japio
机译:用途:为了廉价地生产致密且高硬度的耐磨膜,该膜通过简单的步骤就可以很好地牢固粘附在基材上,即使在不形成基材的情况下也不会在基材的边界上形成膜的龟裂和剥离涂覆前预热基材。 ;组成:在具有惰性气体的气氛中,通过溅射法或离子镀法,使用具有上述成分的蒸发源材料,在基材上形成膜。用Al a Ti b 表示(其中62at%≤a≤85at。%,15at。%≤b≤38at。%和a + b = 100at。% )或Al c Ta d (其中60at。%≤c≤80at。%,20at。%≤d≤40at。%和c + d = 100at。 (%),同时连续或逐步改变氮气系统的反应气体的供给速率。在组件中更换的耐磨硬质薄膜。由上述复合物的基本上非晶态的金属构成的梯度和结构。朝向膜表面的(Al,Ti)N或(Al,Ta)N结晶陶瓷相变为α。 COPYRIGHT:(C)1994,JPO&Japio

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