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SULFATE-FREE ELECTROLESS COPPER PLATING BATHS

机译:无硫酸盐无电镀铜浴

摘要

Sulfate-free electroless copper baths comprising cupric ions, formaldehyde, formate ions, hydroxyl ions, a copper counterion, e.g. preferably a monovalent anion such as acetate, nitrate or formate, and copper chelant such as an alkali metal salt of aminotris(methylenephosphonic acid), biscarboxymethylaspartic acid, ethylenediaminetetra(methylenephosphonic acid), diethylenetriaminepenta(methylenephoshonic acid), gluconic acid, 1-hydroxyethylidene-1,1-diphosphonic acid, mucic acid, D-saccharac acid, tartaric acid and N,N,N',N'-tetrakis(2-hydroxypropyl)ethylenediamine are amenable to the recovery of copper, e.g. from purge streams, using the methods and apparatus including solvent extraction, e.g. employing hydroxamic acid extractants, anion filtration, ion-exchange and chelant precipitation.
机译:包含铜离子,甲醛,甲酸根离子,氢氧根离子,铜抗衡离子(例如铜)的无硫酸盐化学镀铜浴。优选一价阴离子,例如乙酸根,硝酸根或甲酸根,和铜螯合剂,例如氨基三(亚甲基膦酸),双羧甲基天冬氨酸,乙二胺四(亚甲基膦酸),二亚乙基三胺戊(亚甲基膦酸),葡萄糖酸,1-羟基亚乙基-的碱金属盐。 1,1-二膦酸,粘酸,D-蔗糖酸,酒石酸和N,N,N',N'-四(2-羟丙基)乙二胺适合于铜的回收,例如使用包括溶剂萃取例如使用异羟肟酸萃取剂,阴离子过滤,离子交换和螯合剂沉淀。

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